T-UMC10-15FS - Ø1" Dispersion-Compensating Mirror, 650 nm - 1050 nm, 10° AOI, Qty. 1
T-UMC10-15FS - Ø1" Dispersion-Compensating Mirror, 650 nm - 1050 nm, 10° AOI, Qty. 1
- >99.5% Absolute Reflectance from 650 to 1050 nm
- Group Delay Dispersion (GDD) per Reflection: -1.5 mm of Fused Silica (-54 fs2 at 800 nm)
- Clear Aperture: >80% of Diameter
- 10° AOI
T-UMC05-15FS and T-UMC10-15FS chirped mirrors feature >99.5% absolute reflectance over the 650 - 1050 nm wavelength range. The coating is engineered such that each reflection compensates for the dispersion introduced by 1.5 mm of fused silica over the entire range. The 10° AOI allows these mirrors to perform similarly for both s- and p-polarized light, and is ideal for a compact setup where multiple reflections are needed.
- Chirped Mirrors Designed for Dispersion Compensation:
- UMCx-15FS: Each Reflection Compensates for Group Delay (GD) of 1.5 mm of Fused Silica
- DCMP175: Large GD Compensates for Long Path Lengths in Multiphoton Microscopy
- High Reflectance and Low AOI Allow Multiple Reflections
- Fused Silica Substrates
| Specifications | |
|---|---|
| Item # | T-UMC10-15FS |
| Wavelength Range | 650 - 1050 nm |
| Reflectance over Wavelength Range | Rabs > 99.5% over Wavelength Range |
| Group Delay Dispersion (GDD) per Reflection | -54 fs2 at 800 nm |
| Size | Ø1" |
| Diameter Tolerance | +0.00 / -0.10 mm |
| Thickness | 9.5 mm (0.37") |
| Thickness Tolerance | ±0.20 mm |
| Clear Aperture | >80% of Diameter |
| Angle of Incidence (AOI) | 10° |
| Surface Flatness | λ/4 at 632.8 nm Over Clear Aperture |
| Surface Quality | 15-5 Scratch-Dig |
| Back Surface | Polished |
| Laser-Induced Damage Threshold | 0.07 J/cm2 (800 nm, 43.2 fs FWHM, S-Pol, 10 000 Pulses) |
| Substrate | Fused Silica |
| Parallelism | ≤3 arcmin |