T-XM16P8 - Ø8 mm Plano Supermirror on Ø1" UVFS Substrate, 300 000 Finesse, 1156 nm
T-XM16P8 - Ø8 mm Plano Supermirror on Ø1" UVFS Substrate, 300 000 Finesse, 1156 nm
- Plano or Concave (1 m Radius of Curvature) Supermirrors with 1156 nm Center Wavelength
- Finesse in a Two-Mirror System: 300 000
- Optimal for Frequency Doubling 1156 nm to the Ytterbium Clock Transition at 578 nm
- Optical Absorption: <1 ppm Typical
- Optical Scatter: <5 ppm Typical
- Center Wavelength 1156 nm
- Mirror Shape Plano
- Finesse 300 000
- Crystalline Coating Reflectance >99.999% at 1156 nm
- Crystalline Coating Transmission >3.5 ppm at 1156 nm
- Substrate Material Corning 7980 0A UV Fused Silicag
- Surface Roughness Crystalline Coating:
<1.5 Å (RMS)
Back Side:
<1 Å (RMS)
| Crystalline Coating Loss Angle | <4 x 10-5 at 300 K <5 x 10-6 at 10 K |
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| Damage Threshold | CW | 46.2 kW/cm (1064 nm, Ø5.5 mm) | |||||||||||
| Pulsed | 5 J/cm2 (1030 nm, 10 ns, 10 Hz, Ø0.240 mm) | ||||||||||||
| AR Coating Reflectance (Back Side) | <0.1% at Center Wavelength; 0° AOI over Central Ø5 mm | ||||||||||||
| Plano Mirror Specifications | ||
|---|---|---|
| Side of Optic | Front Side | Back Side |
| Surface Flatness (Peak to Valley) |
<λ/10 at 633 nm over Central Ø10 mm | <λ/10 at 633 nm over Central Ø19.5 mm |
| Surface Quality | 10-5 Scratch-Dig over Central Ø10 mm, 20-10 Scratch-Dig from Ø10 mm to Bevel |
20-10 Scratch-Dig over Central Ø19.5 mm |