foscoconnect.com
sales@foscoconnect.com
(510) 319-9878
Silicon Valley, CA, USA
sales@foscoconnect.com
(510) 319-9878
Silicon Valley, CA, USA
T-UM05-45U - Ø1/2" Low GDD Ultrafast Mirror, 355 - 445 nm, 45° AOI
- Designed for Frequency-Doubled Ultrafast Ti:Sapphire Laser Pulses
- Ideal for Laser Pulses Shorter than 250 fs
- Reflectance Greater than 99%
- Low Group Delay Dispersion: |GDD| < 30 fs2
- Available in Ø1/2" and Ø1" Sizes
- For Use at a 45° Incident Angle
| Item # | T-UM05-45U |
|---|---|
| Design Wavelength Range | 355 - 445 nm |
| Diameter | 1/2" (12.7 mm) |
| Diameter Tolerance | +0.00 mm / -0.10 mm |
| Thickness | 6.4 mm (0.25") |
| Thickness Tolerance | ±0.20 mm |
| Clear Aperture | >80% of Diameter |
| Reflectance | Rs > 99% (355 - 445 nm) Rp > 99% (370 - 425 nm) |
| Angle of Incidence | 45° |
| Group Delay Dispersion | |GDDs| < 30 fs² (355 - 445 nm) |GDDp| < 30 fs² (370 - 425 nm) |
|
Laser Induced Damage Thresholda |
0.081 J/cm2 (400 nm, 55 fs FWHM, S-Pol, 1 Pulse) 0.062 J/cm2 (400 nm, 55 fs FWHM, S-Pol, 10000 Pulses) |
| Substrate | Fused Silica |
| Front Surface Flatness | λ/10 at 632.8 nm Over Clear Aperture |
| Front Surface Quality | 15-5 Scratch-Dig |
| Parallelism | ≤3 arcmin |
| Back Surface | Polished |